Hoplite – Zerif Technologies Ltd.

EHT Semi Hoplite™ | Wafer Bias | Chucking | 18 kV, 5 kW, 130 A, 600 MHz

Unipolar | Tightly Controlled Wafer Voltages | Narrow Ion Energy Distributions (IED) | Small Critical Dimensions

EHT Semi "Hoplite™":

Application

Benefits

Controller Options

An optional EHT controller allows for TCP/IP or EtherCAT control. Other industrial protocols can be rapidly developed if needed. Alternatively, the pulse width and pulse repetition frequency can be controlled directly via fiber and an external signal generator.

Output Voltage Control

Output voltage can be adjusted on two timescales. For pulse-to-pulse adjustments, the pulse width can be reduced, which charges the load capacitance to a lower voltage. On longer timescales, the external DC supply set point can be changed.

Internal Sensor Suite

Hoplite 5 kW, 0-18 kV, 130 A, and 80-600 kHz Unipolar Pulse Generator is featured with improved etch quality, complexity, time optimizes wafer on-time, and capabilities.
Hoplite™: 5 kW, 0-18 kV, 130 A, and 80-600 kHz Unipolar Pulse Generator.
Hoplite Unipolar Pulse Generator Waveform: 15.4 kV operation at 400 kHz PRF into simulated plasma sheath load, the pulse width and pulse repetition frequency can be controlled directly via fiber and an external signal generator.
Hoplite™ Waveform: 15.4 kV operation at 400 kHz PRF into simulated plasma sheath load.